Please use this identifier to cite or link to this item:
https://hdl.handle.net/10216/64729| Author(s): | Joaquim F. Silva Gomes |
| Title: | Fotoelasticidade, Parte II: Princípios Básicos |
| Issue Date: | 1984 |
| Subject: | Ciências Tecnológicas, Ciências da engenharia e tecnologias Technological sciences, Engineering and technology |
| Scientific areas: | Ciências da engenharia e tecnologias Engineering and technology |
| URI: | https://hdl.handle.net/10216/64729 |
| Document Type: | Artigo em Revista Científica Nacional |
| Rights: | openAccess |
| License: | https://creativecommons.org/licenses/by-nc/4.0/ |
| Appears in Collections: | FEUP - Artigo em Revista Científica Nacional |
This item is licensed under a Creative Commons License
