Please use this identifier to cite or link to this item: https://hdl.handle.net/10216/64729
Author(s): J. F. Silva Gomes
Title: Fotoelasticidade, Parte II: Princípios Básicos
Issue Date: 1984
Subject: Ciências Tecnológicas, Ciências da engenharia e tecnologias
Technological sciences, Engineering and technology
Scientific areas: Ciências da engenharia e tecnologias
Engineering and technology
URI: https://repositorio-aberto.up.pt/handle/10216/64729
Document Type: Artigo em Revista Científica Nacional
Rights: openAccess
License: https://creativecommons.org/licenses/by-nc/4.0/
Appears in Collections:FEUP - Artigo em Revista Científica Nacional

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