Please use this identifier to cite or link to this item: https://hdl.handle.net/10216/64729
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dc.creatorJoaquim F. Silva Gomes
dc.date.accessioned2026-01-22T00:12:44Z-
dc.date.available2026-01-22T00:12:44Z-
dc.date.issued1984
dc.identifier.issn0870-8444
dc.identifier.othersigarra:65843
dc.identifier.urihttps://hdl.handle.net/10216/64729-
dc.language.isopor
dc.rightsopenAccess
dc.rights.urihttps://creativecommons.org/licenses/by-nc/4.0/
dc.subjectCiências Tecnológicas, Ciências da engenharia e tecnologias
dc.subjectTechnological sciences, Engineering and technology
dc.titleFotoelasticidade, Parte II: Princípios Básicos
dc.typeArtigo em Revista Científica Nacional
dc.contributor.uportoFaculdade de Engenharia
dc.subject.fosCiências da engenharia e tecnologias
dc.subject.fosEngineering and technology
Appears in Collections:FEUP - Artigo em Revista Científica Nacional

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